OPRX

Fast Data Optimization

OPRX lets semiconductor lithography engineers solve lithography problems that are not easily handled with conventional data preparation software. With OPRX every feature edge in a circuit layout can have a unique placement bias that is determined by its spatial relation to nearby features. Line widths can be corrected by biasing edge placements. Line shortening can be corrected by lengthening the lines or by fattening the line ends with "hammerheads". Corner rounding can be corrected with serifs and interior corner rounding can be corrected with corner pullbacks. OPRX can also generate exposure assist features and slots.

See our OPRX Slide Show: Small/LowRes or Large/HiRes

Learn more about OPRX's Features.

See Robust OPC with OPRX.

See Examples of Optical Proximity Correction with OPRX.

Product Descriptions are ready for your perusal.

Here are more examples of Process Matching.

Our process matching methodology, Parametric Anchoring. This is how to match your process measurements to our process models.

Read the online copies of OPRX Publications.

Trans Vector Technologies, Inc.
184 Estaban Drive, Camarillo CA 93010-1611 USA
Voice: (805) 484 2775 FAX: (805) 484 2718
E-mail: info@tvt.com

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This page last modified on December 13, 1999